Level: Beginner
This Project is to improve the Cpk by reducing the particle generated in PECVD with time. The particle problem leads to yield loss and high cost of production. The whole production time is devide into 3 stages. (1) Fit particle data with JMP Poisson & ZIP Distribution. (2) Combine particle data with JMP Goal Plot, Performance Plot & SPC Control Chart. (3) Compare the performance with Dunnett's Method. (4) Combine Poisson Distribution with Goal Plot to modify the action plan for the next stages.
This project aims to reduce PECVD particle generation over time and improve Cpk. Particle issues lead to lower yields and higher manufacturing costs. The overall production time is divided into three stages: (1) Fit particle data with JMP Poisson and ZIP distributions. (2) Combine particle data using JMP Goal Plots, Performance Plots, and SPC Control Charts. (3) Compare performance with Dunnett's Method. (4) Combine the Poisson distribution and goal plot to revise the action plan for the next stage.
Module Process Engineer from Applied Materials Corp., in JMP process. River had been a PECVD (Plasma Enhance Chemical Vapor Deposition) engineer since 2015 for 5 years and as module process engineer since 2021 for 1 years. River's research focus on defect /variability / COO reduction and Process Cpk /Matching /Output optimization; Identify opportunities or increase values for Applied service with those learnings.
I am a module process engineer at JMP Process at Applied Materials, Inc. I have worked as a PECVD (Plasma Enhanced Chemical Vapor Deposition) engineer for five years since 2015, and as a module process engineer for one year since 2021. My research topic is defect - Reducing variability and COO, and optimizing process Cpk, matching and output. These learnings will help Applied Materials identify opportunities and improve value for its services.
