Speakers : Hans Hsu, Applied Materials, CVD Process Engineer
the speech topic : Application of JMP Gage R&R analysis in panel manufacturing for Particle inspection machines
speech abstract :
In the panel manufacturing process, we use AOI optical inspection machines to scan how many micron-sized particles exist on a piece of glass, but it is difficult to evaluate whether there are misjudgments or missed judgments. Usually, it is manually confirmed by taking pictures Whether there is really a particle in the scanned position, but the number of photos that can be taken is far from covering the area of the entire glass. In statistics, conventional Gage R&R is generally used for quantitative analysis of the numerical values of physical properties. But the existence of particles is the difference between 0 and 1, and there is no way to do quantitative analysis. Therefore, this speech mainly discusses how to quantitatively analyze the Gage R&R of the particle inspection machine.
